Week In Review: Semiconductor Manufacturing, Test
Japanese and American trade officials announced a joint roadmap for cooperation in strengthening global semiconductor supply chains by advancing Japan-U.S. collaboration with emerging and developing...
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193i Lithography Takes Center Stage…Again
Cutting-edge lithography to create smaller features increasingly is being supplemented by improvements in lithography for mature process nodes, both of which are required as SoCs and complex chips are...
View ArticleThe Next Chip Shortages?
The rollout of chiplets and heterogeneous designs could have unexpected implications on a global scale, creating a whole new round of chip shortages that will be much harder to fix. It’s impossible to...
View ArticleMulti-Beam Writers Are Driving EUV Mask Development
By Jan Hendrik Peters (bmbg consult) and Ines Stolberg (Vistec Electron Beam) The European Mask and Lithography Conference (EMLC) 2023, held in Dresden this past June, was attended by about 180 people...
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High-NA Lithography Starting To Take Shape
The future of semiconductor technology is often viewed through the lenses of photolithography equipment, which continues to offer better resolution for future process nodes despite an almost perpetual...
View ArticleNovel Assist Layers To Enhance EUV Lithography Performance Of Photoresists On...
In EUV lithography, good resist patterning requires an assist layer beneath it to provide adhesion to prevent pattern collapse of small features and allow for higher aspect ratios. In addition, future...
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Directed Self-Assembly Finds Its Footing
Ten years ago, when the industry was struggling to deliver EUV lithography, directed self-assembly (DSA) roared to the forefront of research and development for virtually every manufacturer determined...
View ArticleSurvey: 2023 eBeam Initiative Luminaries Survey Results
Luminaries are confident in high-NA EUV and curvilinear masks 12th Annual Luminaries Survey — July 2023 • Luminaries remain confident in broad High-NA EUV adoption by 2028 • Confidence doubled in...
View ArticleComputational Lithography Solutions To Enable High NA EUV
This white paper identifies and discusses the computational needs required to support the development, optimization, and implementation of high NA extreme ultraviolet (EUV) lithography. It explores the...
View ArticleThe High NA EUV Imperative: How Computational Lithography Solutions Enable Us...
The future of computing depends on miniaturization, and extreme ultraviolet lithography (EUV) is one key enabler. Until recently, we have relied on low numerical aperture (NA) EUV systems with an...
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